Possible Causes of Orange Peel from Polysilicon Tube Sputtering Targets

0200-09315 HChuck, ESC Cover Ring, Ceramic

0200-00234 ISOLATOR BKM1 ENHANCED TXZ 200MM

Problems with process parameters

1. Excessive sputtering power:

- Excessive sputtering power may result in high local temperatures on the target surface, causing uneven evaporation and deposition of the material, resulting in the formation of an orange peel surface.

- You can check the power settings of the sputtering device to see if it is out of the target range.

2. The sputtering air pressure is not suitable

- If the sputtering air pressure is too low, the average free path of the particles may be too long, the particle energy will be too high, and a large impact force will be generated when it hits the surface of the target, so that the surface morphology of the target will change.

- If the air pressure is too high, the sputtered particles may collide too much before reaching the substrate, reducing the energy and directionality of the particles, and may also lead to uneven deposition on the surface of the target.

- You need to adjust the appropriate sputtering pressure according to the characteristics of the target and the process requirements.

 

Target quality issues

1. The purity of the target is insufficient：

- The presence of impurities may affect the sputtering performance and surface quality of the target. During sputtering, impurities may be preferentially sputtered out or react with the target, resulting in uneven surface phenomena on the target.

- You can check the purity certificate of the target or perform a composition analysis on the target to determine if there are any impurities.

2. The internal structure of the target is uneven:

- During the manufacturing process of the target, if there are porosity, cracks or other defects inside, it may gradually be exposed during the sputtering process, affecting the surface quality.

- You can perform metallographic analysis or other inspection methods on the target to check that its internal structure is homogeneous.

Equipment issues

The magnetic field is not uniform

- The magnetic field in sputtering equipment plays an important role in the sputtering process. If the magnetic field is not uniform, the sputtered particles will be unevenly distributed, resulting in the formation of orange peel on the surface of the target.

- You can check the position of the magnetic field coil and the current strength to ensure that the magnetic field is evenly distributed.

2. The substrate temperature is too high：

- Substrate temperatures that are too high may result in a decrease in the quality of the film layer deposited on the substrate and may also affect the sputtering process on the target surface. If the substrate temperature is too high, the diffusion rate of sputtered particles on the substrate will be accelerated, which may lead to uneven deposition on the target surface.