0020-20123 HEATER, ISOLATOR CERAMIC

# Product Overview

Part Number: 0020-20123

Type: HEATER, ISOLATOR CERAMIC (Ceramic Insulated Heater Assembly)

Applicable Process: May be used in CVD (Chemical Vapor Deposition), ALD (Atomic Layer Deposition) or Annealing equipment

# Key Features & Functions

Core Functions: - Integrated heater + insulator design to provide precise temperature control while ensuring galvanic isolation - Heating elements mainly used in the wafer carrier stage (ESC) or reaction chamber preheating area

Material & Construction:

- Heating element: Platinum (Pt) or tungsten (W) resistance wire, high temperature resistance up to more than 800°C

- Insulator: High purity alumina ceramic (Al₂O₃) or aluminum nitride ceramic (AlN) with:

✓ Excellent dielectric strength (>10kV/mm)

✓ Low coefficient of thermal expansion

✓ Plasma erosion resistance - Interface design: standardized power/signal connection terminals 3. Technical parameters (typical):

| Parameter | Specifications |

| Operating temperature range | Room temperature ~650°C |

| Heating rate | ≥20°C/min |

| Temperature uniformity | ±2°C @300mm range |

| Insulation Resistance | >100MΩ @500VDC |

Compatibility:

- Compatible with Producer/Centura Series Equipment

- Compliant with SEMI F47 voltage sag standard

--- # Application Scenarios

- Thin Film Deposition Process: Maintain a Constant Temperature in the Reaction Chamber - Wafer bonding: Provides a uniform heating field

- Annealing after ion implantation: Precise temperature control repairs lattice damage

--- # Maintenance Points

Preventive Maintenance:

- Check insulation resistance values monthly

- Calibrate temperature sensors quarterly

Troubleshooting: - Check for uneven heating:

• Cracks on the surface of the ceramic

• Oxidation of the electrode

Replacement Notes:

- Must use the original thermal paste

- Installation torque: 6.5±0.5 N·m

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